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A Systematic dry etching process for profile control of quantum dots and nanoconstrictions.

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Nano patterning of cone dots and nanoconstritions of negative E-beam resist for single electron transistor fabrication.

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Fabrication and characterization of Silicon Quantum Dots and SiO2 Tunnel Barriers Grown by A Controlled Oxidation Process.

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A Simple oxidation technique for quantum dot dimention shrinkage and tunnel barriers generation.

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Optimization of negative tone E-Beam for Nanolithography Process.

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Periodicity of coulomb blokade oscillation in single electron transistor.

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Requirements for design and fabrication of silicon single electron transistors based on its applications.

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Negative tone photoresist optimization of dot of Single Electron Transistor (SET) fabrication.

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Designing of masks for quantum dot transistor febrication using SEM-Based-EBL System.

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Quantum dot single electron transistor structure formation using e.beam lithography.

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